User:John R. Brews/Devices

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Devices

Devices
Mesa diode structure (top) and planar diode structure with guard-ring (bottom).
(PD) Image: John R. Brews
Mesa diode structure (top) and planar diode structure with guard-ring (bottom).
A planar bipolar junction transistor as might be constructed in a integrated circuit.
(PD) Image: John R. Brews
A planar bipolar junction transistor as might be constructed in a integrated circuit.
Gummel plot and current gain for a GaAs/AlGaAs heterostructure bipolar transistor.
(PD) Image: John R. Brews
Gummel plot and current gain for a GaAs/AlGaAs heterostructure bipolar transistor.
Quasi-Fermi levels and carrier densities in forward biased pn-diode.
(PD) Image: John R. Brews
Quasi-Fermi levels and carrier densities in forward biased pn-diode.
Cross section of MOS capacitor showing charge layers
(PD) Image: John R. Brews
Cross section of MOS capacitor showing charge layers
Three types of MOS capacitance vs. voltage curves. VTH = threshold, VFB = flatbands 
(PD) Image: John R. Brews
Three types of MOS capacitance vs. voltage curves. VTH = threshold, VFB = flatbands 
Small-signal equivalent circuit of the MOS capacitor in inversion with a single trap level
(PD) Image: John R. Brews
Small-signal equivalent circuit of the MOS capacitor in inversion with a single trap level
A modern MOSFET
(PD) Image: John R. Brews
A modern MOSFET
A power MOSFET; source and body share a contact.
(PD) Image: John R. Brews
A power MOSFET; source and body share a contact.
Two bipolar transistor modes, showing extrapolation of asymptotes to the Early voltage.
(PD) Image: John R. Brews
Two bipolar transistor modes, showing extrapolation of asymptotes to the Early voltage.
Channel length modulation in 3/4μm technology.
(PD) Image: John R. Brews
Channel length modulation in 3/4μm technology.
Early voltage for MOSFETs from a 0.18μm process as a function of channel strength.
(PD) Image: John R. Brews
Early voltage for MOSFETs from a 0.18μm process as a function of channel strength.
Calculated density of states for crystalline silicon.
(CC) Image: John R. Brews
Calculated density of states for crystalline silicon.
Field effect: At a gate voltage above threshold a surface inversion layer of electrons forms at a semiconductor surface.
(CC) Image: John R. Brews
Field effect: At a gate voltage above threshold a surface inversion layer of electrons forms at a semiconductor surface.
Occupancy comparison between n-type, intrinsic and p-type semiconductors.
(PD) Image: John R. Brews
Occupancy comparison between n-type, intrinsic and p-type semiconductors.
Nonideal pn-diode current-voltage characteristics
(PD) Image: John R. Brews
Nonideal pn-diode current-voltage characteristics
Band-bending diagram for pn-junction diode at zero applied voltage
(PD) Image: John R. Brews
Band-bending diagram for pn-junction diode at zero applied voltage
Band-bending for pn-diode in reverse bias
(PD) Image: John R. Brews
Band-bending for pn-diode in reverse bias
Quasi-Fermi levels in reverse-biased pn-junction diode
(PD) Image: John R. Brews
Quasi-Fermi levels in reverse-biased pn-junction diode
Band-bending diagram for pn-diode in forward bias
(PD) Image: John R. Brews
Band-bending diagram for pn-diode in forward bias
Fermi occupancy function vs. energy departure from Fermi level in volts for three temperatures
(PD) Image: John R. Brews
Fermi occupancy function vs. energy departure from Fermi level in volts for three temperatures
Fermi surface in k-space for a nearly filled band in the face-centered cubic lattice
(PD) Image: John R. Brews
Fermi surface in k-space for a nearly filled band in the face-centered cubic lattice